mso jena is now able to deposit optical filters onto photodetector wafers with 2 to 8 inch diameter. The filter coating modifies the spectral response of photodiodes, phototransistors, or CMOS sensors according to customer requirements. Typical applications are NIR block filters or bandpass filters with out-of-band blocking between 350 and 1100 nm. Bondpads are kept free of the coating by means of a photolithography process.

Compared to the use of separate optical filters, the direct deposition onto the wafer saves the thickness of the filter substrate and the expense for mounting. A particular benefit is the high positioning accuracy of the filter coating. It allows to deposit several filters onto adjacent photodetectors of a die.